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CFDRC provides advanced simulation software, collaborative R&D, and
consultation services for the analysis, design and optimization of semiconductor
integrated circuit and MEMs device fabrication processes. State-of-the-art
equipment and process analysis requires the incorporation of complex physical
and chemical interactions from the wafer scale to device feature critical
dimensions and atomic scales. Simulation of these complex tools and processes
is made possible by the multiphysics software package CFD-ACE+, feature
scale topography simulator CFD-TOPO, and extensive experience in process
model development via computational chemistry.
Our mission is to enable rapid screening of concepts and optimization
of downselected designs (simulation-based design) and processes, thereby
accelerating your product development.
CFDRC has extensive experience in many different facets of semiconductor
and MEMs device fabrication, including:
- Wafer and Equipment Scale Process Analysis
- Device Feature Scale Process Analysis
- Process Model Development
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