- Kern W, Vossen J, editors: Thin Film Process - II. Academic Press,
1991. Gives an overview of plasma enhanced CVD, plasma-assisted
etching, sputter deposition cathodic arc plasma and basic principles
of glow discharges and their application for material processing.
- Popov O, editor: High Density Plasma Sources: Design. Noyes Publications,
1995. A collection of papers devoted to high density plasma sources.
- Kortshagen U, Tsendin LD, editors: Electron Kinetics and Applications
of Glow Discharges, volume 302 of NATO ASI Series B, page 407. Plenum
Press, New York, 1998. A collection of articles on electron kinetics
in gas discharges.
- Kersch A, Morokoff WJ: Transport Simulation in Microelectronics,
Birkhauser, Basel, 1995. A good introduction to a variety of transport
phenomena on the level of the Boltzmann equation.
- Lichtenberg A, Lieberman MA: Principles of Plasma Discharges and
Materials Processing, 1995. Describes the principles of plasma discharges
and material processing.
- Hershkowitz N: Role of plasma aided manufacturing in semiconductor
fabrication, IEEE Trans. PS, 26:1610, 1998. Describes the role of
plasma-aided manufacturing in semiconductor fabrication.
- Hochber A, Middleman S: Process Engineering Analysis in Semiconductor
Device Fabrication. McGraw-Hill, 1993. Gives an overview of different
approaches to modeling semiconductor related processes with the special
emphasis on plasma etching.
- Hitchon WNG: Plasma Processing for Semiconductor Fabrication. Cambridge
University Press, 1999. Good introduction for those who have no
prior knowledge of plasma physics.
- Raizer Y: Gas Discharge Physics, Springer-Verlag, Berlin, 1991.
A book devoted to physics of gas discharge plasma.
- Raizer YP, Shneider MN, and Yatsenko NA: Radio Frequency Capacitive
Discarges. CRC Press, Boca Raton, 1995. A book devoted to capacitive
discharges and their applications for gas laser excitation.
- Reactions (PDF)
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