Development of chemical mechanism is a critical and highly specialized capability. Meaningful analysis or design of any chemically reacting process requires accurate models of the relevant reactions involved. CFDRC’s scientists and engineers have the expertise to develop and deliver customized reaction models and reaction mechanisms.

Physical Models for Reactions

The critical species and reaction paths for a process are determined by:

• Use of internal and external data bases
• Reaction Rate Theory
• Computational Chemistry
• Ab initio
• Semi-empirical
• Group additive methods

Examples of chemically reacting processes for which we have provided services include Chemical Vapor Deposition (CVD), chemical Vapor Infiltration (CVI), Atomic Layer Deposition (ALD), Catalytic converters, and combustion.

Currently available mechanisms are:

• MOCVD of GaN, AlGaN, AlN, InN, InP


• CVD of Si, SiO2 and SiC.


• Plasma chemistry of CF₄, C₂F₆, N₂, O₂, BCl₃ and all noble gases


• Catalytic combustion of methane